Optical EB Gun EGP-1G
This is an electron beam evaporation source for optical film deposition that reduces costs. [ULVAC]
The EGP-1G is an electron beam evaporation source for optical film deposition that keeps costs down by adopting a simple 180° beam deflection method. Furthermore, by employing a two-sided positioning structure, it has a model with high beam position reproducibility after maintenance. 【Specifications】 ○ Electron beam deflection angle: 180° ○ Cooling water flow rate: 10L/min ○ Dimensions (W×D×H) excluding protrusions: 185mm×239mm×179mm ○ Weight: 11kg ○ Maximum output: 10kW For more details, please contact us or download the catalog.
- 企業：アルバック／ULVAC, Inc.
- 価格：Other
